（College of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China）
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DOI:
10.7502/j.issn.1674-3962.2012.08.06
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Abstract:
Diamond films possess many remarkable properties. Among the various techniques to deposit diamond films, high power microwave plasma chemical vapor deposition (MPCVD) method has the advantages of high density plasma, good controllability and clean environment free from electrode material contamination. Therefore, MPCVD has remains the primary technique useful for depositing high quality diamond films. Western countries have developed abilities to deposit high quality diamond films by using high power MPCVD techniques. In contrast, slow development in high power MPCVD apparatus has remained a main obstacle for China to develop its ability to produce high quality diamond films material. In this article, we first review the evolution of high power MPCVD diamond films deposition techniques both abroad and at home. Then, we will present new results of our recent effort to develop high power MPCVD diamond films deposition techniques.