(FEI Company, Unit 102, Building No 8, Micro-electronics Port, No.690 Bibo Road, Pudong, Shanghai 201203, China)
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DOI:
10.7502/j.issn.1674-3962.2013.12.02
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Abstract:
In this article the theory and structure of FIB are introduced. The features and applications of Dualbeam system composed by electron beam and focused ion beam are discussed in details. The trend of Duelbeam technology is emphasized intensively. Three main functions and applications are discussed in details. The application and present progress of gas injection system (GIS) are introduced. The important application of ultra-high resolution scanning electron microscope are discussed. The important applications of Dualbeam in scientific research and industrial fabrication are discussed: Micro/Nano fabrication, TEM thin sample, 3D characterization, circuit edit. The advantages and of weakness of common methods for nanofabrication are discussed. The unique virtue of Dualbeam in processing thin samples are introduced. The new application progresses in 3D imaging, 3D EDS, 3D EBSD are introduced. The important application of Dualbeam in semiconductor industry is introduced. The method and related technology for circuit edit are illustrated. In the end the application status of Dualbeam in Chinese scientific research is discussed shortly, the important progress of Chinese researchers are introduced.