Institute of Information Optical engineering, Soochow University, Suzhou, Jiangsu, 215006
*SVG Optronics，Suzhou， 215026
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DOI:
10.7502/j.issn.1674-3962.2014.03.01
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Abstract:
Micro-nanofabrication technique is mainly used in optoelectronic and IC field. With the development of a new round of international printed electronics technology, more and more precision line width of the printed electronics devices is required. The related printed materials and application technology should match these trends for the characteristics and performances. However, the traditional printing technologies are difficult to achieve such precision circuits. Based on micro-and nano patterning lithography, the roll to roll nano-imprint technology and related nano-assembly technologies, the developments for the flexible micro-nano manufacturing technology have been briefly introduced. The printed circuit line width has been reduced from dozens of microns to several microns or even submicron, for example, for the large-size transparent conductive films with micro-metal mesh structures, the line with of metal mesh circuits and size of film have been achieved to 1.5 micron and 42”, respectively. This kind of process is also "additive" manufacturing. Therefore, the micro-nano flexible manufacturing will become one of the core technologies and the powerful tool of a new round of revolutionary development for the printed electronic materials and devices.