文章信息/Info

Title:

 Focused Ion Beam (FIB) and its Applications

作者:

 韓偉; 肖思群

 （FEI Company，上海，浦東，碧波路690號，8號樓102室）

Author(s):

Han Wei' target="_blank" rel="external">’serif’">Wei ;  Xiao Siqun

 (FEI Company, Unit 102, Building No 8, Micro-electronics Port, No.690 Bibo Road, Pudong, Shanghai 201203, China)

關鍵詞:

 ; 聚焦離子束; 電子束; 雙束; 氣體注入系統; 微納圖形加工; TEM樣品制備; APT樣品制備; 三維表征; 電路編輯

DOI:

10.7502/j.issn.1674-3962.2013.12.02

文獻標志碼:

A

摘要:

 本文介紹了聚焦離子束（FIB）的原理及結構，詳細討論了電子束與離子束組成的雙束系統的特點及應用。特別強調了最新的雙束技術發展趨勢。詳細論述了離子束的三種常用功能及應用，介紹了氣體注入系統(GIS)系統的應用及發展現狀。討論超高分辨率掃描電鏡在雙束中的重要應用。本文詳細論述了雙束系統在科研和工業生產中的重要應用：如微納加工、透射電鏡的薄樣品制備、三維表征、電路編輯等方面的應用。討論各種各種常用微納加工方法的優缺點，介紹了雙束在薄樣品制備方面獨特的優勢，介紹了三維圖像、三維能譜、三維EBSD的發展及最新應用進展。介紹了雙束在半導體行業的重要應用，展示線路編輯的實現方法及相關技術。最后簡要介紹了在中國科研領域雙束的應用狀況，介紹了中國科研工作者利用雙束獲得的重要成果。

Abstract:

In this article the theory and structure of FIB are introduced. The features and applications of Dualbeam system composed by electron beam and focused ion beam are discussed in details. The trend of Duelbeam technology is emphasized intensively. Three main functions and applications are discussed in details. The application and present progress of gas injection system (GIS) are introduced. The important application of ultra-high resolution scanning electron microscope are discussed. The important applications of Dualbeam in scientific research and industrial fabrication are discussed: Micro/Nano fabrication, TEM thin sample, 3D characterization, circuit edit. The advantages and of weakness of common methods for nanofabrication are discussed. The unique virtue of Dualbeam in processing thin samples are introduced. The new application progresses in 3D imaging, 3D EDS, 3D EBSD are introduced. The important application of Dualbeam in semiconductor industry is introduced. The method and related technology for circuit edit are illustrated. In the end the application status of Dualbeam in Chinese scientific research is discussed shortly, the important progress of Chinese researchers are introduced.