[1]康浩,楊明慶,牛春暉,等.氧化銻錫納米材料及其薄膜的制備和光電性能的研究進(jìn)展[J].中國材料進(jìn)展,2022,41(03):197-205.[doi:10.7502/j.issn.1674-3962.202008011]
KANG Hao,YANG Mingqing,NIU Chunhui,et al.Progress in the Preparation and Photoelectrical Properties of Antimony Tin Oxide Nanomaterials and Their Thin Films[J].MATERIALS CHINA,2022,41(03):197-205.[doi:10.7502/j.issn.1674-3962.202008011]
點(diǎn)擊復(fù)制
氧化銻錫納米材料及其薄膜的制備和光電性能的研究進(jìn)展(
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中國材料進(jìn)展[ISSN:1674-3962/CN:61-1473/TG]
- 卷:
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41
- 期數(shù):
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2022年第03期
- 頁碼:
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197-205
- 欄目:
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- 出版日期:
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2022-03-30
文章信息/Info
- Title:
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Progress in the Preparation and Photoelectrical Properties of Antimony Tin Oxide Nanomaterials and Their Thin Films
- 文章編號:
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1674-3962(2022)03-0197-09
- 作者:
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康浩; 楊明慶; 牛春暉; 劉力雙; 王京飛; 呂勇
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(北京信息科技大學(xué)儀器科學(xué)與光電工程學(xué)院,北京 100192)
- Author(s):
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KANG Hao; YANG Mingqing; NIU Chunhui; LIU Lishuang; WANG Jingfei; LV Yong
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(School of Instrumentation Science and Opto-Electronics Engineering, Beijing Information Science and Technology University, Beijing 100192, China)
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- 關(guān)鍵詞:
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氧化銻錫; 納米材料; 薄膜; 透過率; 電阻率
- Keywords:
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antimony tin oxide; nanomaterial; film; transmittance; resistivity
- 分類號:
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TB383;O484.4
- DOI:
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10.7502/j.issn.1674-3962.202008011
- 文獻(xiàn)標(biāo)志碼:
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A
- 摘要:
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氧化銻錫因其固有的高可見光透過率、良好的紅外屏蔽性能和導(dǎo)電性,可應(yīng)用于節(jié)能建筑、光電器件以及軍事隱身等領(lǐng)域,得到了廣泛的研究。主要概述了氧化銻錫納米材料及其薄膜制備技術(shù)的研究現(xiàn)狀,介紹了沉淀法、溶膠凝膠法、水熱法/溶劑熱法等納米材料制備技術(shù),以及噴霧熱解法、脈沖激光沉積法、磁控濺射法和涂覆法等薄膜制備技術(shù),分析了銻摻雜濃度、干燥方式、煅燒溫度、氧氣流量、薄膜厚度等工藝參數(shù)對氧化銻錫納米材料及其薄膜的結(jié)構(gòu)特征、光電性能的影響。介紹了氧化銻錫薄膜在光電、建筑、軍事等領(lǐng)域的應(yīng)用現(xiàn)狀,總結(jié)了各種制備技術(shù)的優(yōu)缺點(diǎn),并就該領(lǐng)域存在的問題及未來的研究和應(yīng)用方向進(jìn)行了討論和展望。
- Abstract:
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Antimony tin oxide (ATO) has been extensively studied in energy-saving buildings, photoelectric devices and military stealth technology due to its inherent high visible light transmittance, good infrared shielding performance and electrical conductivity. In this review, progresses in synthesis of ATO nanomaterials and their thin films in recent years are presented. The fabrication methods of ATO nanomaterials such as precipitation method, sol-gel method, hydrothermal method or solvent thermal method, as well as their films such as spray pyrolysis method, pulsed laser deposition method, magnetron sputtering method and coating method are reviewed in detail. The factors of antimony doping concentration, drying method, temperature, oxygen flow, thickness of film on the nanostructures and photoelectric properties of ATO and ATO films are discussed. The application of ATO films in the fields of optoelectronics, architecture and military are also introduced. Finally, the advantages and disadvantages of various fabrication methods are summarized, and current challenges faced in practical application and the trend of future development are presented and discussed.
備注/Memo
- 備注/Memo:
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收稿日期:2020-08-12修回日期:2020-09-08 基金項(xiàng)目:國家自然科學(xué)基金資助項(xiàng)目(21607158);“十三五” 裝備預(yù)研共用技術(shù)和領(lǐng)域基金項(xiàng)目(41414050205);國防軍工重點(diǎn)計(jì)量科研項(xiàng)目(JSJL2019208B001)第一作者:康浩,男,1994年生,碩士研究生通訊作者:楊明慶,男,1982年生,副研究員,碩士生導(dǎo)師, Email:yangmingqing@bistu.edu.cn 呂勇,男,1971年生,教授,碩士生導(dǎo)師, Email:lvyong@bistu.edu.cn
更新日期/Last Update:
2022-02-25